What is Atomic Layer Etching? Atomic layer etching (ALE) is a highly controlled and selective etching technique that removes material layer by layer at the atomic scale. It is a cyclic process that ...
Atomic layer etching (ALE) is the reverse of atomic layer deposition (ALD). ALE can be achieved using sequential, self-limiting thermal reactions. We have recently demonstrated Al 2 O 3 ALE [1-3] and ...
As impossible as that sounds, atomic layer deposition (ALD) is a reality. In fact, it’s being used in an ever-increasing number of applications as an extremely precise and controllable process for ...
Oxford Instruments Plasma Technology PlasmaPro 100 Cobra 300 ICP RIE ALE The Oxford Instruments Cobra is perhaps the highest performance R&D etch system in the academic world. Our system is configured ...
Astrophysics observations at ultraviolet (UV) wavelengths often probe the most dynamic aspects of the universe. However, the high energy ...
Atomic Layer Etching (or ALE) is a sophisticated etch method enabling outstanding depth control on shallow features. As device feature size decreases, ALE is required to achieve the accuracy needed ...
The U.S. Department of Energy’s Argonne National Laboratory has made new advances in the field of molecular layer etching or etch (MLE). MLE is related to atomic layer etch (ALE). Used in the ...
George. There, he works on SRC project 3083.001: »Gas-Phase Methods for Selective Thermal Atomic Layer Etching of Si-Based Materials«. From 2019–2021, he successfully completed SRC project 2871.001: ...
and Atomic Layer Etching (ALEt). The center serves also as a valuable resource to other fields of research that require state-of-the-art techniques for thin film characterisation and resolving surface ...
Hosted on MSN1mon
Plasma technique doubles etch rate for 3D NAND flash memoryBy investigating new approaches to making digital memory at the atomic scale ... were tested separately, the etch rate increased for the nitride and the oxide layer using the hydrogen fluoride ...
there is a need for ever more precise process control to create and manipulate these layers. The PlasmaPro 100 ALE offers this by improving the Cobra ICP platform along with specialized hardware for ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results